Bis(Isopropylcyclopentadienyl)Tungsten Dihydride 双(异丙基环戊二烯)二氢化钨

CAS 64561-25-7 MFCD04126431

化学结构图

64561-25-7
SMILES: [WH2].CC(C)[C]1[CH][CH][CH][CH]1.CC(C)[C]1[CH][CH][CH][CH]1 |^1:4,5,6,7,8,12,13,14,15,16|

化学属性

Mol. Formula(C5H4CH(CH3)2)2WH2
Mol. Weight400.20
Boiling Point230 °C(lit.)
Refractive indexn20/D 1.6(lit.)
TSCANo

别名和识别编码

Chemical NameBis(Isopropylcyclopentadienyl)Tungsten Dihydride
MDL NumberMFCD04126431
PubChem Substance ID24873641
CAS Number64561-25-7
Chemical Name Translation双(异丙基环戊二烯)二氢化钨
Synonym 双(异丙基环戊二烯)二氢化钨(IV)
LabNetwork Molecule IDLN02144944
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分类

  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Tungsten, Tungsten Catalysts, Vapor Deposition Precursors, 材料科学
  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Tungsten, Vapor Deposition Precursors
  • {SA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Tungsten, Vapor Deposition Precursors

安全信息

WGK Germany3
Personal Protective Equipment Eyeshields, Gloves, half-mask respirator (US), multi-purpose combination respirator cartridge (US)
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S37 Wear suitable gloves 戴适当手套；
  • S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
UN Number UN3398
Risk Statements
  • R10 Flammable 易燃
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R14 Reacts violently with water 遇水会猛烈反应
Storage condition Air & Moisture Sensitive
Packing GroupIII

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Tungsten - Catalysis and Inorganic Chemistry
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Tungsten - CVD and ALD Precursors by Metal
  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. 医药合成催化剂

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