2-(Trimethylsilyl)Ethoxymethyl Chloride 2-(氯甲氧基)乙基三甲硅烷

CAS 76513-69-4 MFCD00009919

化学结构图

76513-69-4
SMILES: C[Si](C)(C)CCOCCl

化学属性

Mol. FormulaC6H15ClOSi
Mol. Weight166.72
Refractive index1.4340 to 1.4380
Boiling Point170-172 °C at 760 mmHg
Density0.942
Flash Point46°C(lit.)
TSCANo
Solubilitydecomposes
Stability对湿度、光线、热敏感
pH:A

别名和识别编码

Chemical Name2-(Trimethylsilyl)Ethoxymethyl Chloride
Synonym (2-(Chloromethoxy)ethyl)trimethylsilane {LY} (2-(Chloromethoxy)ethyl)trimethylsilane 2-(Trimethylsilyl)ethoxymethyl Chloride {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimethylsilane {} {} {} {} {} {} {} {} {} {} {} {} {LY} (2-(Chloromethoxy)ethyl)trimet
PubChem Substance ID87566351
EC Number278-483-4
Beilstein Registry Number3587289
MDL NumberMFCD00009919
CAS Number76513-69-4
Alfabeta NameTRIMETHYLSILYLETHOXYMETHYLCHLORIDE 2()-
Reaxys-RN3587289
Chemical Name Translation2-(氯甲氧基)乙基三甲硅烷
InChIKeyBPXKZEMBEZGUAH-UHFFFAOYSA-N
LabNetwork Molecule IDLN00009381
Canonical SMILESC[Si](CCOCCl)(C)C
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分类

  • {SNA} Chemical Synthesis, Protecting and Derivatizing Reagents, Protection and Derivatization, Silicon-Based, Synthetic Reagents

产品应用

  • Reagent for the introduction of a protected C1 building block;Protecting-group reagent for alcohols, pyrroles,imidazoles and other functional groups.

安全信息

GHS Symbol
WGK Germany3
Hazard statements
  • H226 Flammable liquid and vapour 易燃液体和蒸气
  • H314 Causes severe skin burns and eye damage 导致严重的皮肤灼伤和眼睛损伤
Personal Protective Equipment Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Precautionary statements
  • P240 Ground/bond container and receiving equipment. 与地面接触/连接集装箱和接受设备。
  • P260 Do not breathe dust/fume/gas/mist/vapours/spray. 不要吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P301+P330+P331
  • P301+P330+P331+P310
  • P303+P361+P353
  • P305+P351+P338
  • P305+P351+P338+P310
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或医生/医师。
  • P370+P378
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Signal word Danger
Warnings IRRITANT
Safety Statements
  • S20 When using do not eat or drink 使用时，不得进食，饮水；
  • S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S28 After contact with skin, wash immediately with plenty of ... (to be specified by the manufacturer) 皮肤接触后，立即用大量…（由生产厂家指定）冲洗；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
Hazard Codes 8 C
Risk Statements
  • R10 Flammable 易燃
  • R34 Causes burns 会导致灼伤
Packing GroupII
UN Number 2920
Storage condition -20°C, protect from light, stored under nitrogen {LY} -20°C, protect from light, stored under nitrogen -20℃ 0-10 0-10°C Moisture Sensitive {} {LY} -20°C, protect from light, stored under nitrogen {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {LY} -20°C, protect from light, stored under nitrogen {} {} {} {} {} {} {} {} {} {} {} {LY} -20°C, protect from light, stored under
Hazard Class8/3

其他信息

  • F:8-10-21
  • Sigma Aldrich:76513-69-4(sigmaaldrich)
  • This is used to prepare a SEM-ether which, removed with BBr3 and cyclized to a benzo-oxapane. Phenol protecting group in the synthesis of laterifluorones.

系列性分类

  1. Chemical Synthesis 化学合成
  2. Synthetic Reagents 合成试剂
  3. Protection and Derivatization - Synthetic Reagents
  1. Chemical Synthesis 化学合成
  2. Organometallic Reagents 金属有机试剂
  3. Organosilicon 有机硅
  4. Trialkoxysilanes - Organosilicon
  1. Chemical Synthesis 化学合成
  2. Synthetic Reagents 合成试剂
  3. Protection and Derivatization - Synthetic Reagents
  4. Protecting and Derivatizing Reagents - Protection and Derivatization
  1. Chemical Synthesis 化学合成
  2. Synthetic Reagents 合成试剂
  3. Protection and Derivatization - Synthetic Reagents
  4. Protecting and Derivatizing Reagents - Protection and Derivatization
  5. Silicon-Based - Protecting and Derivatizing Reagents
  1. Chemical Synthesis 化学合成
  2. Synthetic Reagents 合成试剂
  3. Protection and Derivatization - Synthetic Reagents
  4. Protecting and Derivatizing Reagents - Protection and Derivatization
  5. Silicon-Based - Protecting and Derivatizing Reagents
  1. Chemical Synthesis 化学合成
  2. Synthetic Reagents 合成试剂
  3. Silicon Compounds for Organic Synthesis 硅化合物

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