Triethylgallium 三乙基镓

CAS 1115-99-7 MFCD00015094

化学结构图

1115-99-7
SMILES: CC[Ga](CC)CC

化学属性

Mol. FormulaC6H15Ga
Mol. Weight156.91
Density1.0586
Flash Point69.8°F
Appearance colorless liq.
Stabilitymoisture sensitive
Boiling Point143°C
Melting Point-82.3°C

别名和识别编码

Chemical NameTriethylgallium
Synonym Triethylgallium {LY} Triethylgallium gallium, triethyl- triethylgallium {} {LY} Triethylgallium {} {} {LY} Triethylgallium {} {} {} {LY} Triethylgallium {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Triethylgallium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {L
EC Number214-232-7
Chemical Name Translation三乙基镓
InChIKeyRGGPNXQUMRMPRA-UHFFFAOYSA-N
LabNetwork Molecule IDLN02179047
PubChem Substance ID66198
InChIInChI=1S/3C2H5.Ga/c3*1-2;/h3*1H2,2H3;
MDL NumberMFCD00015094
CAS Number1115-99-7
Canonical SMILESCC[Ga](CC)CC
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分类

  • {uni_hamburg} no charge; metal-organic; 1fragment
  • {SA} 31: Gallium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Gallium, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors

相关文献及参考

  • Short: III/20b Title: Nuclear Quadrupole Resonance Spectroscopy Data: Nuclei Cl ... Rb Author: Chihara, H.; Nakamura, N. Editor: Hellwege, K.-H.; Hellwege, A.M. Source: Landolt-Börnstein, New Series Volume: III/20b Year: 1988 Keyword: NQR ISBN: 3-540-18483-X ISBN: 978-3-540-18483-6 Internet Resource: DOI:10.1007/b86664 RefComment: IX,717 pages. Hardcover Abstract: Nuclear Quadrupole Resonance Spectroscopy has become a standard method for structural research in molecular and solid state physics as well as for different branches of chemistry. The volumes cover data for more than 8,000 substances in the solid state. Data for free molecules have been published in volumes II/14 and II/15 of the New Series. The tables are arranged according to the atomic number of the elements.
  • Short: IV/8A Title: Enthalpies of Fusion and Transition of Organic Compounds Author: Zhang, Z.-Y.; Frenkel, M.; March, K.N.; Wilhoit, R.C. Editor: Marsh, K.N. Source: Landolt-Börnstein, New Series Volume: IV/8A Year: 1995 Keyword: organic compounds; enthaly of fusion; melting point; phase transition ISBN: 3-540-58854-X ISBN: 978-3-540-58854-2 Internet Resource: DOI:10.1007/b55145 RefComment: VIII, 588 pages.
  • Short: EINECS Title: EINECS (European Inventory of Existing Commercial Chemical Substances) Source: Official Journal of the European Communities Volume: C 146 A (15.06.1990) Page: 1 Year: 1990 Internet Resource: http://ecb.jrc.ec.europa.eu/esis/index.php?PGM=ein Publish_Date: 1990/06/15
  • M. Yamaguchi Sci. Synth. 7 , 387, (2004)
  • Vossen, J. L.; Kern, W. Thin Film Processes II 1991 , 866

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P222 Do not allow contact with air. 不要与空气接触。
  • P422 Store contents under… 存储目录在…之下。
  • P231+P232
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
  • P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
Hazard statements
  • H261 In contact with water releases flammable gas 与水接触时释放可燃气体。
  • H314 Causes severe skin burns and eye damage 导致严重的皮肤灼伤和眼睛损伤
  • H225 Highly flammable liquid and vapour 高度易燃液体和蒸气
  • H250 Catches fire spontaneously if exposed to air 暴露于空气自发着火
Signal word Danger
Storage condition

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Gallium - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  1. CVD & ALD Precursors
  2. Gallium
  1. Metal Alkyls
  2. Gallium

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