Silicon(IV) Bromide 溴化硅(IV)

CAS 7789-66-4 MFCD00049530

化学结构图

7789-66-4
SMILES: Br[Si](Br)(Br)Br

化学属性

TSCAYes
Vapor Density2.8 (vs air)
Flash Point154°C
Refractive index1.5627
Mol. FormulaSiBr4
Mol. Weight348
Density2.772
Appearance colorless liq.
Stabilitymoisture sensitive
Boiling Point154°C
Melting Point5.4°C

别名和识别编码

Chemical NameSilicon(IV) Bromide
Synonym SILICON BROMIDE TETRABROMOSILANE 溴化硅 SILICON TETRABROMIDE, 99.995% tetrabromosilane 溴化硅(IV) Silicon(IV) bromide SILICON(IV) BROMIDE Silicon(IV) bromide(tetrabromosilane) 四溴化硅 SILICON TETRABROMIDE, 99+% Siliciumtetrabromid Silicon tetrabromide Silicon(Ⅳ)bromide Silicon bromide (SiBr4) Silicon(IV)bromide,99+% SILICON TETRABROMIDE silicon (IV) bromide Silicium(IV)-bromid Silane, tetrabromo- SiBr4 tetrabromo-silan Silane,tetrabromo-
PubChem Substance ID82247
EC Number232-182-4
MDL NumberMFCD00049530
Merck Number14,8499
Chemical Name Translation溴化硅(IV)
LabNetwork Molecule IDLN00196501
InChIInChI=1S/Br4Si/c1-5(2,3)4
CAS Number7789-66-4
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分类

  • {SNA} CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Silicon, Vapor Deposition Precursors
  • {uni_hamburg} no charge; 1fragment
  • {SNA} CVD and ALD Precursors by Metal, Micro/NanoElectronics, Silicon, Vapor Deposition Precursors, 材料科学

相关文献及参考

  • Short: II/25A Title: Structure Data Of Free Polyatomic Molecules: Inorganic Molecules Author: Graner, G.; Hirota, E.; Iijima, T.; Kuchitsu, K.; Ramsay, D.A.; Vogt, J.; Vogt, N. Editor: Kuchitsu, K. Source: Landolt-Börnstein, New Series Volume: II/25A Year: 1998 Keyword: Free Polyatomic Molecules; Inorganic Molecules; Molecules ISBN: 3-540-61713-2 ISBN: 978-3-540-61713-6 Internet Resource: DOI:10.1007/b59072 RefComment: VII, 359 pages. Hardcover Abstract: Volume II/25 is a supplemented and revised edition of the preceding volumes II/7, II/15, II/21 and II/23 containing up to date information on inorganic and organic polyatomic molecules. All experimental methods for the determination of quantitative structural data of free molecules have been considered: microwave, infrared, Raman, electronic and photoelectron spectroscopy as well as electron diffraction. The data obtained by these methods have been critically evaluated and compiled. They are presented separately for each molecule, together with a schematic figure of the structure and the original literature.
  • Short: III/20b Title: Nuclear Quadrupole Resonance Spectroscopy Data: Nuclei Cl ... Rb Author: Chihara, H.; Nakamura, N. Editor: Hellwege, K.-H.; Hellwege, A.M. Source: Landolt-Börnstein, New Series Volume: III/20b Year: 1988 Keyword: NQR ISBN: 3-540-18483-X ISBN: 978-3-540-18483-6 Internet Resource: DOI:10.1007/b86664 RefComment: IX,717 pages. Hardcover Abstract: Nuclear Quadrupole Resonance Spectroscopy has become a standard method for structural research in molecular and solid state physics as well as for different branches of chemistry. The volumes cover data for more than 8,000 substances in the solid state. Data for free molecules have been published in volumes II/14 and II/15 of the New Series. The tables are arranged according to the atomic number of the elements.
  • Short: III/35F Title: Nuclear Magnetic Resonance (NMR) Data: Chemical Shifts and Coupling Consta

安全信息

GHS Symbol
WGK Germany3
Hazard Codes C
Hazard statements
  • H314 Causes severe skin burns and eye damage 导致严重的皮肤灼伤和眼睛损伤
Personal Protective Equipment Faceshields, full-face respirator (US), Gloves, Goggles, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Precautionary statements
  • P310 Immediately call a POISON CENTER or doctor/physician. 立即呼救解毒中心或医生/医师。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
Signal word Danger
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S27 Take off immediately all contaminated clothing 立即脱掉全部污染的衣服；
  • S28 After contact with skin, wash immediately with plenty of ... (to be specified by the manufacturer) 皮肤接触后，立即用大量…（由生产厂家指定）冲洗；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
  • S7/8 Keep container tightly closed and dry 保存在严格密闭容器中，保持干燥；
  • S20 When using do not eat or drink 使用时，不得进食，饮水；
  • S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
UN Number UN 3264 8/PG 2 UN3264
Risk Statements
  • R34 Causes burns 会导致灼伤
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R14 Reacts violently with water 遇水会猛烈反应
Storage condition Moisture Sensitive
Packing GroupII
Hazard Class8

其他信息

  • MOL 文件:7789-66-4.mol
  • 蒸气密度:2.8 (vs air)
  • F:10-23
  • Alfa Aesar:溴化硅(IV) Silicon(IV) bromide(7789-66-4)
  • 敏感性:Moisture Sensitive
  • Sigma Aldrich:7789-66-4(sigmaaldrich)
  • TSCA:Yes

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Silicon - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  2. Silicon
  1. Halides for CVD & ALD
  2. Silicon