Bis(Pentamethylcyclopentadienyl)Ruthenium(II) 双(五甲基环戊二烯)钌(II)

CAS 84821-53-4 MFCD00058889

化学结构图

84821-53-4
SMILES: C[C]1[C](C)[C](C)[C](C)[C]1C.C[C]1[C](C)[C](C)[C](C)[C]1C.[Ru]

化学属性

Melting Point260 °C (dec.)(lit.)
TSCANo
Mol. FormulaC20H30Ru
Appearance off-white xtl.
Mol. Weight371.53

别名和识别编码

Chemical NameBis(Pentamethylcyclopentadienyl)Ruthenium(II)
Synonym 双(五甲基环戊烯)钌 Decamethylruthenocene
PubChem Substance ID22045963
Chemical Name Translation双(五甲基环戊二烯)钌(II)
MDL NumberMFCD00058889
CAS Number84821-53-4
InChIInChI=1S/2C10H15.Ru/c2*1-7-6-10(4,5)9(3)8(7)2;/h2*1-5H3;/q2*-1;+2
LabNetwork Molecule IDLN02178622
信息真实价格透明    资金保障    专业采购外包团队在线服务   
信息真实价格透明    资金保障    专业采购外包团队在线服务   
品牌质保精细包装    现货库存    一流品牌服务   

分类

  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Ru Catalysts, Ruthenium, Ruthenium Catalysts, Vapor Deposition Precursors

相关文献及参考

  • FT-IR 2 (3), 4569:B

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Hazard Codes Xi
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Signal word Warning
Safety Statements
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S36/37 Wear suitable protective clothing and gloves 穿戴适当的防护服和手套；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
Storage condition Air & Moisture Sensitive

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Ruthenium 钌
  4. Ru Catalysts - Ruthenium
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Ruthenium - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  1. CVD & ALD Precursors
  2. Ruthenium
  1. Organometallics for CVD & ALD
  2. Ruthenium
  1. Metallocenes, Derivatives & Cp Precursors
  2. Ruthenium

相关产品推荐