Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) 双(2,2,6,6-四甲基-3,5-庚二酮)化铜

CAS 14040-05-2 MFCD00058920

化学结构图

14040-05-2
SMILES: CC(C)(C)/C(=C/C(=O)C(C)(C)C)/O[Cu]O/C(=C\C(=O)C(C)(C)C)/C(C)(C)C

化学属性

TSCANo
Mol. FormulaC22H38CuO4
Mol. Weight430.05
Appearance blue xtl.
Boiling Pointdec. 315°C (subl. 88°C/0.05mm)
Melting Point198°C

别名和识别编码

Chemical NameBis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II)
Synonym Copper(II)-DPM 双(2,2,6,6-四甲基-3,5-庚二酮酸)铜 Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper; Bis(dipivaloylmethanato)copper(II); Bis(2,2,6,6-tetramethyl-3,5-heptanedione)copper; Bis(hexamethylacetylacetonato)copper(II); Copper bis(2,2,6,6-tetramethyl-3,5-heptanedionate); Copper bis(2,2,6,6-tetramethyl-3,5-heptanedione); Cupric 2,2,6,6-tetramethyl-3,5-heptanedionate; Di(dipivaloylmethanato)copper
PubChem Substance ID11080499
Chemical Name Translation双(2,2,6,6-四甲基-3,5-庚二酮)化铜
InChIKeyPEMCLTTUCGSLGJ-ATMONBRVSA-N
MDL NumberMFCD00058920
CAS Number14040-05-2
LabNetwork Molecule IDLN02126884
InChIInChI=1S/2C11H20O2.Cu/c2*1-10(2,3)8(12)7-9(13)11(4,5)6;/h2*7,12H,1-6H3;/b2*8-7-;
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分类

  • {SA} CVD and ALD Precursors by Metal, Copper, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors
  • {SNA} CVD and ALD Precursors by Metal, Copper, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学

相关文献及参考

  • Beilstein: 1,III,3149

安全信息

Safety Statements
  • S37/39 Wear suitable gloves and eye/face protection 穿戴适当的手套和眼睛/面保护；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S37 Wear suitable gloves 戴适当手套；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
WGK Germany3
GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Hazard Codes Xi
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Signal word

其他信息

  • 不溶于水

系列性分类

  1. Chemical Synthesis 化学合成
  2. Organometallic Reagents 金属有机试剂
  3. Organocopper - Organometallic Reagents
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Copper - CVD and ALD Precursors by Metal
  1. CVD & ALD Precursors
  1. CVD & ALD Precursors
  2. Copper
  1. Metal Beta-diketonates
  2. Copper
  1. Metal TMHD / THD
  2. Copper
  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. 医药合成催化剂

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