Hafnium tert-butoxide 叔丁醇铪

CAS 2172-02-3 MFCD00070458

化学结构图

2172-02-3
SMILES: CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-].CC(C)(C)[O-].[Hf+4]

化学属性

Mol. FormulaHf[OC(CH3)3]4
Mol. Weight470.94
Refractive indexn20/D 1.424(lit.)
Boiling Point90 °C/5 mmHg(lit.)
Density1.166 g/mL at 25 °C(lit.)
Flash Point28°(82°F)
TSCANo
SolubilitySoluble in hydrocarbons, reacts with alcohols, ketones, and esters
Melting Point2°
Stabilitylight sensitive, moisture sensitive
Appearance liq. (may contain small amount of white sediment)

别名和识别编码

Chemical NameHafnium tert-butoxide
CAS Number2172-02-3
PubChem Substance ID9934444
MDL NumberMFCD00070458
Synonym Tetrakis(tert-butoxy)hafnium {LY} Tetrakis(tert-butoxy)hafnium {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {} {} {} {} {} {} {} {} {} {} {} { {} {} {} {} {} {} {} {} {} {} {} {} {} {} {LY} Tetrakis(tert-butoxy)hafnium {} {} {} {
Chemical Name Translation叔丁醇铪
InChIInChI=1S/4C4H9O.Hf/c4*1-4(2,3)5;/h4*1-3H3;/q4*-1;+4
LabNetwork Molecule IDLN01237189
Canonical SMILESOC(C)(C)C.[Hf].[1/4]
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分类

  • Hafnium, Materials Science, Micro/NanoElectronics, Solution Deposition Precursors
  • {SNA} 72: Hafnium, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Hafnium, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
  • {SNA} Hafnium, Materials Science, Micro/Na

相关文献及参考

  • Williams, P. A.; et al J. Mater. Chem. 2nd ed., 12 , 165, (2002)
  • Dabrian, A.; et al. Cryst. Growth Des. 1st ed., 11 , 203, (2011)

安全信息

GHS Symbol
WGK Germany3
Hazard statements
  • H225 Highly flammable liquid and vapour 高度易燃液体和蒸气
  • H226 Flammable liquid and vapour 易燃液体和蒸气
  • H302 Harmful if swallowed 吞食有害
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Personal Protective Equipment Eyeshields, Faceshields, full-face respirator (US), Gloves, multi-purpose combination respirator cartridge (US), type ABEK (EN14387) respirator filter
Precautionary statements
  • P210 Keep away from heat/sparks/open flames/hot surfaces. — No smoking. 远离热源/火花/明火/热的表面。——禁止吸烟。
  • P233 Keep container tightly closed. ?保持容器密闭。
  • P240 Ground/bond container and receiving equipment. 与地面接触/连接集装箱和接受设备。
  • P241 Use explosion-proof electrical/ventilating/lighting/…/equipment. 使用防爆电气/通风/照明/ .../设备。
  • P242 Use only non-sparking tools. 只能使用无火花工具。
  • P243 Take precautionary measures against static discharge. 采取预防措施，防止静电放电。
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
  • P270 Do not eat, drink or smoke when using this product. 使用本产品时不要吃东西，喝水或吸烟。
  • P271 Use only outdoors or in a well-ventilated area.? 只能在室外或通风良好的地方使用。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P301+P312
  • P302+P352
  • P303+P361+P353
  • P304+P340
  • P305+P351+P338
  • P312 Call a POISON CENTER or doctor/physician if you feel unwell. 如果你感觉不适，呼叫解毒中心或医生/医师。
  • P321 Specific treatment (see … on this label). 具体治疗（见本标签上的）。
  • P330 Rinse mouth. 漱口
  • P332+P313
  • P337+P313
  • P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
  • P370+P378
  • P403+P233
  • P403+P235
  • P405 Store locked up. 上锁保管。
  • P501 Dispose of contents/container to..… 处理内容物/容器.....
Signal word Warning
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S37 Wear suitable gloves 戴适当手套；
  • S16 Keep away from sources of ignition - No smoking 远离火源，禁止吸烟；
  • S60 This material and its container must be disposed of as hazardous waste 该物质及其容器必须作为危险废物处置；
  • S23 Do not breathe gas/fumes/vapour/spray (appropriate wording to be specified by the manufacturer) 不要吸入气体/烟雾/蒸汽/喷雾；
Risk Statements
  • R10 Flammable 易燃
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R36/38 Irritating to eyes and skin 对眼睛和皮肤有刺激性
Storage condition Air & Moisture Sensitive Moisture Sensitive
Hazard Codes Xi
Packing GroupIII
Hazard Class3
UN Number UN 1993 3/PG 3 UN1993

其他信息

  • 敏感性:Moisture Sensitive/Light Sensitive
  • 丁氧铪价格(试剂级):更新日期 产品编号 产品名称 包装 价格 2010/05/25 41908 叔丁醇铪, 99.9% (metals basis excluding Zr), Zr< 0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2% 50g 18060元 2010/05/25 41908 叔丁醇铪, 99.9% (metals basis excluding Zr), Zr< 0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2% 2g 1131元 2010/05/25 41908 叔丁醇铪, 99.9% (metals basis excluding Zr), Zr< 0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2% 10g 4746元
  • Alfa Aesar:<0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%(2172-02-3)" href="http://www.alfa.com/zh/GP100w.pgm?DSSTK=41908&CAS;=2172-02-3">叔丁醇铪,99.9%(metalsbasisexcludingZr),Zr<0.2% Hafnium tert-butoxide, 99.9% (metals basis excluding Zr), Zr< 0.2%(2172-02-3)
  • Sigma Aldrich:2172-02-3(sigmaaldrich)
  • TSCA:No
  • MOL 文件:2172-02-3.mol

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Solution Deposition Precursors - Micro/NanoElectronics
  4. Hafnium - Solution Deposition Precursors
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Hafnium - CVD and ALD Precursors by Metal
  1. Alkoxide
  2. Hafnium
  1. CVD & ALD Precursors
  1. CVD & ALD Precursors
  2. Hafnium
  1. Metal Alkoxides for CVD & ALD
  2. Hafnium

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