mono-Methyl cis-5-norbornene-endo-2,3-dicarboxylate 顺-5-降冰片烯-内-2,3-二羧酸单甲酯

CAS 96185-91-0 MFCD00167751

化学结构图

96185-91-0
SMILES: COC(=O)[C@@H]1[C@H]2C[C@H](C=C2)[C@@H]1C(O)=O |&1:4,5,7,10|

化学属性

Mol. FormulaC10H12O4
Mol. Weight196
Melting Point103-105 °C(lit.)

别名和识别编码

Chemical Namemono-Methyl cis-5-norbornene-endo-2,3-dicarboxylate 95%
MDL NumberMFCD00167751
PubChem Substance ID24861512
Synonym 顺-5-降冰片烯-内-2,3-二羧酸单甲酯
Chemical Name Translation顺-5-降冰片烯-内-2,3-二羧酸单甲酯
CAS Number96185-91-0
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分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly & Contact Printing, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Polymer Science, Self Assembly and Lithography, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Self Assembly & Contact Printing

安全信息

WGK Germany3
GHS Symbol
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
Hazard statements
  • H332 Harmful if inhaled 吸入有害
  • H315 Causes skin irritation 会刺激皮肤
  • H302 Harmful if swallowed 吞食有害
  • H312 Harmful in contact with skin 皮肤接触有害
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
  • H319 Causes serious eye irritation 严重刺激眼睛
Signal word Warning
Personal Protective Equipment dust mask type N95 (US), Eyeshields, Gloves
Hazard Codes Xn
Safety Statements
  • S37/39 Wear suitable gloves and eye/face protection 穿戴适当的手套和眼睛/面保护；
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R20/21/22 Harmful by inhalation, in contact with skin and if swallowed 吸入、皮肤接触和不慎吞咽有害

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Self Assembly & Contact Printing - Micro/NanoElectronics
  4. Lithography Monomers - Self Assembly & Contact Printing
  5. Alicyclic/Etch-Resistant Monomers - Lithography Monomers

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