2,2'-(Adamantane-1,3-Diyl)Diacetic Acid 1,3-金刚烷二乙酸
CAS 17768-28-4 MFCD00191708
化学结构图
SMILES: OC(=O)C[C@@]12C[C@@]3(CC(O)=O)C[C@@H](C1)C[C@@H](C2)C3 |&1:4,6,12,15|
化学属性
| Mol. Formula | C14H20O4 |
|---|---|
| Mol. Weight | 252 |
| Melting Point | 235-238 |
别名和识别编码
| Chemical Name | 2,2'-(Adamantane-1,3-Diyl)Diacetic Acid |
|---|---|
| CAS Number | 17768-28-4 |
| Alfabeta Name | CARBOXYMETHYLADAMANTYLACETICACID 31[]()--- |
| MDL Number | MFCD00191708 |
| Synonym | 1,3-Bis(carboxymethyl)adamantane 1,3-金刚烷二乙酸 2-[3-(Carboxymethyl)-1-adamantyl]acetic acid H2ADA |
| PubChem Substance ID | 87562812 |
| EC Number | 241-751-6 |
| Reaxys-RN | 1884505 |
| Beilstein Registry Number | 1884505 |
| Chemical Name Translation | 1,3-金刚烷二乙酸 |
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分类
- {SNA} Alicyclic/Etch-Resistant Monomers, Carboxylic Acid Monomers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly & Contact Printing
- {SNA} Alicyclic/Etch-Resistant Monomers, Carboxylic Acid Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly & Contact Printing, 材料科学
- Alicyclic/Etch-Resistant Monomers,
- {SNA} Alicyclic/Etch-Resistant Monomers, Carboxylic Acid Monomers, Lithography Monomers, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly and Lithography, 材料科学
相关文献及参考
- Beil. 19 ,278
- FT-IR 2 (1), 843:C / FT-IR 1 (1), 541:D / IR-Spectra (2), 287:E / IR-Spectra (3), 319:D / NMR-Reference 2 (1), 477:B / Structure Index 1 , 84:A:9
安全信息
- H315 Causes skin irritation 会刺激皮肤
- P264 Wash hands thoroughly after handling. 处理后要彻底洗净双手。
- P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
- P302+P352+P332+P313+P362+P364
- P305+P351+P338+P337+P313
- P332+P313
- P362 Take off contaminated clothing and wash before reuse. 脱掉污染的衣服，清洗后方可重新使用
GHS Symbol
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