Bis(ethylcyclopentadienyl)cobalt(II) 双(乙基环戊二烯)钴(II)
CAS 55940-05-1 MFCD01863655
化学结构图
SMILES: [Co].CC[C]1[CH][CH][CH][CH]1.CC[C]1[CH][CH][CH][CH]1 |^1:3,4,5,6,7,10,11,12,13,14|
化学属性
| Mol. Formula | C14H18Co |
|---|---|
| Mol. Weight | 245.23 |
| Density | 1.516 g/mL at 25 °C(lit.) |
| Danger-Level | |
| pH | : |
| Redox |
别名和识别编码
| Chemical Name | Bis(ethylcyclopentadienyl)cobalt(II) |
|---|---|
| Synonym | 双(乙基环戊二烯)钴(II) (EtCp)2Co Bis(ethylcyclopentadienyl)cobalt(II) 1,1′-Diethylcobaltocene (EtCp)2Co 1,1'-Diethylcobaltocene |
| MDL Number | MFCD01863655 |
| PubChem Substance ID | 24873522 |
| CAS Number | 55940-05-1 |
| Chemical Name Translation | 双(乙基环戊二烯)钴(II) |
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分类
- {SNA} 27: Cobalt, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Cobalt, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
- {SNA} CVD and ALD Precursors by Metal, Cobalt, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
- {SA} 27: Cobalt, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Cobalt, Materials Science, Micro/NanoElectronics,
- {SNA} 27: Cobalt, CVD and ALD Precursors Packaged for Deposition Systems, CVD and ALD Precursors by Metal, Cobalt, Materials Science, Micro/NanoElectronics, Vapor Deposition Precurso
相关文献及参考
- Li; L.J.; Khlobystov; A.N.; Wiltshire; J.G.; Briggs; G.A.D.; Nicholas; R.J. Nat. Mater. 4 , 481, (2005) 摘要
- Rushworth; S. Material Matters 4th ed., 5 , 94, (2010)
- Hunde; E.T.; Watkins; J.J. Chem. Mater. 16 , 498, (2004)
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