Exo-Bicyclo[2.2.1]Hept-5-Ene-2-Carboxylic Acid 外-双环[2.2.1]庚烷-5-烯-2-羧酸

CAS 934-30-5 MFCD00934305

化学结构图

934-30-5
SMILES: O=C(O)[C@H]1C[C@@H]2C=C[C@@H]1C2

化学属性

Mol. FormulaC8H10O2
Mol. Weight138.16
Melting Point40-44 °C
Boiling Point266.7±19.0 °C at 760 mmHg

别名和识别编码

Synonym rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid {} {} {} {} {} {} {} {} {} {} {} {LY} rel-(1S,2R,4S)-Bicyclo[2.2.
Wiswesser Line NotationL55 A CUTJ FVQ
Chemical NameExo-Bicyclo[2.2.1]Hept-5-Ene-2-Carboxylic Acid
CAS Number934-30-5
Beilstein Registry Number3196451
Chemical Name Translation外-双环[2.2.1]庚烷-5-烯-2-羧酸
Chemicalbook IDCB52480368
PubChem Substance ID329763554
MDL NumberMFCD00213362
InChIKeyFYGUSUBEMUKACF-UHFFFAOYSA-N
Canonical SMILESOC([C@H]1[C@H]2C[C@H](C=C2)C1)=O
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分类

  • {SNA} Alicyclic/Etch-Resistant Monomers, Building Blocks, C8, Carbonyl Compounds, Carboxylic Acid Monomers, Carboxylic Acids, Chemical Synthesis, Lithography Monomers, Micro/NanoElectronics, Monomers, Norbornene Monomers, Organic Building Blocks, Polymer Science, Self Assembly and Lithography, 材料科学
  • {SNA} Alicyclic/Etch-Resistant Monomers, Building Blocks, C8, Carbonyl Compounds, Carboxylic Acid Monomers, Carboxylic Acids, Chemical Synthesis, Lithography Monomers, Micro/NanoElectronics, Monomers,

安全信息

RTECSRB8195000 
TYPE OF TEST            : LD50 - Lethal dose, 50 percent kill
ROUTE OF EXPOSURE       : Intravenous
SPECIES OBSERVED        : Rodent - mouse
DOSE/DURATION           : 180 mg/kg
TOXIC EFFECTS :
   Details of toxic effects not reported other than lethal dose value
REFERENCE :
   CSLNX* U.S. Army Armament Research & Development Command, Chemical Systems
   Laboratory, NIOSH Exchange Chemicals.  (Aberdeen Proving Ground, MD 21010)
   Volume(issue)/page/year: NX#04752

GHS Symbol
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
Hazard Codes Xi
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H319 Causes serious eye irritation 严重刺激眼睛
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
WGK Germany3
Precautionary statements
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P305+P351+P338
Signal word Warning
Storage condition

系列性分类

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