3-(Perfluoro-7-methyloctyl)-1,2-propenoxide [2,2,3,3,4,4,5,5,6,6,7,7,8,9,9,9-十六氟-8-(三氟甲基)壬基]环氧乙烷
CAS 41925-33-1 MFCD00236089
化学结构图
SMILES: FC(F)(CC1CO1)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(C(F)(F)F)C(F)(F)F
化学属性
| Mol. Formula | C12H5F19O |
|---|---|
| Mol. Weight | 526.14 |
| Density | 1.757 g/mL at 25 °C(lit.) |
| Boiling Point | 93-94 °C/8 mmHg(lit.) |
| Refractive index | n20/D 1.324(lit.) |
| Flash Point | >;230 °F |
别名和识别编码
| Chemical Name | 3-(Perfluoro-7-methyloctyl)-1,2-propenoxide |
|---|---|
| MDL Number | MFCD00236089 |
| PubChem Substance ID | 24870960 |
| CAS Number | 41925-33-1 |
| EC Number | 255-587-8 |
| Synonym | 3-(PERFLUORO-7-METHYLOCTYL)-1,2-PROPENOXIDE [2,2,3,3,4,4,5,5,6,6,7,7,8,9,9,9-十六氟-8-(三氟甲基)壬基]环氧乙烷 |
| Chemical Name Translation | [2,2,3,3,4,4,5,5,6,6,7,7,8,9,9,9-十六氟-8-(三氟甲基)壬基]环氧乙烷 |
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分类
- {SNA} Epoxide Monomers, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Lithography Monomers, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly and Lithography, 材料科学
- {SNA} Epoxide Monomers, Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers, Lithography Monomers, Materials Science, Micro/NanoElectronics, Monomers, Polymer Science, Self Assembly & Contact Printing
安全信息
- S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
- S24/25 Avoid contact with skin and eyes 避免皮肤和眼睛接触；
- R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
其他信息
- Hazard Note:Irritant
- Sigma Aldrich:41925-33-1(sigmaaldrich)
- MOL 文件:41925-33-1.mol
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