Barium bis(2,2,6,6-tetramethyl-3,5-heptanedionate) hydrate

CAS 138521-17-2 MFCD06200255

化学结构图

138521-17-2
SMILES: O.CC(C)(C)/C(=C/C(=O)C(C)(C)C)/O[Ba]O/C(=C\C(=O)C(C)(C)C)/C(C)(C)C

化学属性

Mol. FormulaBa(OCC(CH3)3CHCOC(CH3)3)2· xH2O
Mol. Weight503.86 (anhydrous basis)
Melting Point175-180 °C(lit.)

别名和识别编码

Chemical NameBarium bis(2,2,6,6-tetramethyl-3,5-heptanedionate) hydrate
Synonym 双(2,2,6,6-四甲基-3,5-庚二酮酸)钡 水合物
MDL NumberMFCD06200255
PubChem Substance ID24862341
CAS Number17594-47-7 (anhydrous)
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分类

  • {SNA} Barium, CVD and ALD Precursors by Metal, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors

相关文献及参考

  • 1. Thin Solid Films 182 , 265, (1989)
  • 2. Chem. Abstr. 112 , 149887h, (1989)
  • FT-NMR 1 (3), 755:B / RegBook 1 (2), 3091:F / Structure Index 1 , 489:A:9

安全信息

Precautionary statements
  • P301+P310
  • P311 Call a POISON CENTER or doctor/physician. 呼叫解毒中心或医生/医师。
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P305+P351+P338
WGK Germany1
GHS Symbol
Signal word Danger
Hazard statements
  • H315 Causes skin irritation 会刺激皮肤
  • H331 Toxic if inhaled 吸入中毒
  • H311 Toxic in contact with skin 皮肤接触中毒
  • H301 Toxic if swallowed 吞食有毒
  • H335 May cause respiratory irritation 可能导致呼吸道刺激
  • H319 Causes serious eye irritation 严重刺激眼睛
Hazard Codes T
Safety Statements
  • S26 In case of contact with eyes, rinse immediately with plenty of water and seek medical advice 眼睛接触后，立即用大量水冲洗并征求医生意见；
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S36/37 Wear suitable protective clothing and gloves 穿戴适当的防护服和手套；
Risk Statements
  • R36/37/38 Irritating to eyes, respiratory system and skin 对眼睛、呼吸系统和皮肤有刺激性
  • R23/24/25 Toxic by inhalation, in contact with skin and if swallowed 吸入，皮肤接触及吞食都有毒

系列性分类

  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Barium - CVD and ALD Precursors by Metal

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