Tungsten hexacarbonyl 六羰基钨

CAS 14040-11-0 MFCD00011462

化学结构图

14040-11-0
SMILES:

化学属性

Mol. FormulaW(CO)6
Mol. Weight351.90
Density2.65 g/mL at 25 °C(lit.)
Melting Point150 °C(lit.)
TSCAYes
Vapor Density12.1 (vs air)
Vapor Pressure1.2 mmHg ( 67 °C)
Boiling Point175°C
Solubility不溶
Flash Point200°C
Appearance white xtl. white to off-white pwdr.
Danger-Level-
pH-:-
Redox-

别名和识别编码

Chemical NameTungsten hexacarbonyl
CAS Number14040-11-0
PubChem Substance ID24854483
EC Number237-880-2
MDL NumberMFCD00011462
Synonym Tungsten carbonyl (W(CO)6), (OC-6-11)- Tungsten carbonyl (W(CO)6) Tungstencarbonyl,99%(99.9+%-W)sublimed Tungstenhexacarbonyl Tungstencarbonyl(W(CO)6),(OC-6-11)- Tungsten hexacarbonyl, sublimed, 99.9+% metals basis Tungstene hexacarbonyl NSC 173699 tungstenehexacarbonyl (OC-6-11)-Tungstencarbonyl Wolframhexacarbonyl TUNGSTEN CARBONYL Tungsten carbonyl (oc-6-11)-tungstencarbonyl(w(co)6 Tungstencarbonyl(W(CO)6) W(CO)6 Hexacarbonyl wolfram Tungsten carbonyl 99% Hexacarbonylwolfram TUNGSTEN CARBONYL 99% (<0.3%-MO) Tungstencarbonyl,99%(<0.1%-Mo) Tungsten hexacarbonyl Hexacarbonyltungsten (0) Tungsten carbonyl Tungstenhexacarbonyl 六羰基钨 Hexacarbonyltungsten 六羰基钨 HEXACARBONYLTUNGSTEN Hexacarbonyltungsten (0)
Chemical Name Translation六羰基钨
InChIKeyFQNHWXHRAUXLFU-UHFFFAOYSA-N
LabNetwork Molecule IDLN02003227
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分类

  • {SNA} 74: Tungsten, CVD and ALD Precursors Packaged for Deposition Systems, Micro/NanoElectronics, Vapor Deposition Precursors, 材料科学
  • {SNA} 74: Tungsten, CVD and ALD Precursors Packaged for Deposition Systems, Materials Science, Micro/NanoElectronics, Vapor Deposition Precursors
  • {SNA} CVD and ALD Precursors by Metal,
  • {SA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Materials Science, Micro/NanoElectronics, Tungsten, Vapor Depo
  • {SNA} CVD and ALD Precursors by Metal, Catalysis and Inorganic Chemistry, Chemical Synthesis, Micro/NanoElectronics, Tungsten, Tungsten Catalysts, Vapor Deposition Precursors, 材料科学

产品应用

  • 用于制备含钨的复合物和材料，也用于光化学。用于合成 Fischer 卡宾配合物的前体，可将 Pd(II) 还原为纳米微粒型 Pd(0)，Pd(0) 在 Hiyama 交叉偶联反应中具有催化活性.

相关文献及参考

  • 1. Maruyama, T., Arai, S. J. Electrochem. Soc. 4 , 1021, (1994)
  • 2. Mulders, J. J. L.; Belova, L. M.; Riazanova, A. Nanotechnology 5th ed., 22 , 055302/1, (2011)
  • Fieser 6 ,658 / Fieser 8 ,525 / Fieser 14 ,345
  • Aldrich MSDS 1 , 1821:B / Corp MSDS 1 (2), 3559:C / FT-IR 2 (3), 4590:B / FT-IR 1 (2), 1299:A / RegBook 1 (2), 3141:C / Sax 6 , 1505
  • Short: II/25D Title: Structure Data of Free Polyatomic Molecules: Molecules Containing Five or More Carbon Atoms Author: Graner, G.; Hirota, E.; Iijima, T.; Kuchitsu, K.; Ramsay, D.A.; Vogt, J.; Vogt, N. Editor: Kuchitsu, K. Source: Landolt-Börnstein, New Series Volume: II/25D Year: 2003 Keyword: Free Polyatomic Molecules; Carbon Atoms; Molecules ISBN: 3-540-42860-7 ISBN: 978-3-540-42860-2 Internet Resource: DOI:10.1007/b75952 RefComment: VIII, 569 pages. Hardcover RefComment: Written for scientists and researchers in the fields of chemistry and physics Abstract: This fourth subvolume presents data on the geometric parameters (internuclear distances, bond angles, dihedral angles of internal rotation etc) of free polyatomic molecules including free radicals and molecular ions. The survey on structure data consists of four subvolumes, each containing the geometric parameters determined in the gas phase either by an analysis of the rotational constants (and sometimes the vibrational constants) obtained from microwave, infrared, Raman, electronic and photoelectron spectroscopy or by an analysis of electron diffraction intensities. Most of the structures listed in the tables are for molecules in the electronic ground state, but structures for electronically excited states have also been included as far as they are available. In this fourth subvolume, the structure of molecules containing five to sixty carbon atoms is listed.
  • Short: III/35D5 Title: Nuclear Magnetic Resonance (NMR) Data: Chemi

安全信息

GHS Symbol
WGK Germany3
Hazard Codes T
Hazard statements
  • H301+H311+H331
Personal Protective Equipment Eyeshields, Gloves, type N95 (US), type P1 (EN143) respirator filter
Precautionary statements
  • P301+P310
  • P261 Avoid breathing dust/fume/gas/mist/vapours/spray. 避免吸入粉尘/烟/气体/烟雾/蒸汽/喷雾。
  • P280 Wear protective gloves/protective clothing/eye protection/face protection. 戴防护手套/防护服/眼睛的保护物/面部保护物。
  • P311 Call a POISON CENTER or doctor/physician. 呼叫解毒中心或医生/医师。
Signal word Danger
RTECSYO7705000
Safety Statements
  • S45 In case of accident or if you feel unwell seek medical advice immediately (show the label where possible) 发生事故时或感觉不适时，立即求医（可能时出示标签）；
  • S36 Wear suitable protective clothing 穿戴适当的防护服；
  • S36/37 Wear suitable protective clothing and gloves 穿戴适当的防护服和手套；
  • S36/37/39 Wear suitable protective clothing, gloves and eye/face protection 穿戴适当的防护服、手套和眼睛/面保护；
  • S28 After contact with skin, wash immediately with plenty of ... (to be specified by the manufacturer) 皮肤接触后，立即用大量…（由生产厂家指定）冲洗；
  • S38 In case of insufficient ventilation wear suitable respiratory equipment 通风不良时，佩带适当的呼吸器；
UN Number UN3466
Risk Statements
  • R23/24/25 Toxic by inhalation, in contact with skin and if swallowed 吸入，皮肤接触及吞食都有毒
  • R23/25 Toxic by inhalation and if swallowed 吸入及吞食都有毒
Packing GroupIII
Hazard Class6.1
Restrict -

其他信息

  • Sigma Aldrich:14040-11-0(sigmaaldrich)

系列性分类

  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Tungsten - Catalysis and Inorganic Chemistry
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors by Metal - Vapor Deposition Precursors
  5. Tungsten - CVD and ALD Precursors by Metal
  1. Materials Science 材料科学
  2. Micro/NanoElectronics - Materials Science
  3. Vapor Deposition Precursors - Micro/NanoElectronics
  4. CVD and ALD Precursors Packaged for Deposition Systems - Vapor Deposition Precursors
  5. 74: Tungsten - CVD and ALD Precursors Packaged for Deposition Systems
  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. Titanium
  1. CVD & ALD Precursors
  2. Tungsten
  1. Metal Carbonyls
  2. Tungsten
  1. Metal Carbonyls for CVD & ALD
  2. Tungsten
  1. Chemical Synthesis 化学合成
  2. Catalysis and Inorganic Chemistry 催化剂和无机化学
  3. 医药合成催化剂

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